JX Advanced Metals Corporation has decided to invest in its facilities in Chigasaki Plant and in Hitachi Works. Accordingly, the purpose of the investments is to meet the growing demand for CVD and ALD materials, which are necessary for next-generation semiconductors.
As generative AI continues to evolve, the market for data centers and IoT devices is expanding. Thus, high-performance semiconductors required for these devices need to innovate as well. Specifically, for further miniaturization and multi-layering to achieve higher integration. This will increase the need for film deposition solutions using CVD and ALD.

Braces for Future Expansion

In February 2024, the company established the CVD・ALD Material Business Promotion Office. Accordingly, it aims to accelerate the commercialization of these materials.

Under this organization, the company will build a mass production line for new, high-purity CVD and ALD materials and ship samples to customers. In addition, the company has now decided to increase production capacity in anticipation of a rapid increase in demand amid the full-scale adoption of these materials.

For that reason, the company will install and begin the operation of production equipment at the Chigasaki plant in the second half of FY2024. Thereafter, at Hitachi Works in the first half of FY2025. In addition, the company will enhance its facilities by developing new processes and new materials in preparation for the future expansion of this business.

As semiconductors rapidly increase in sophistication, the company will work to meet growing demand and support the evolution of this technology.
As a global leader in semiconductor and information and communications materials, JX Advanced Metals will continue contributing to the progress and innovation. Moreover, to achieve a sustainable society by developing and supplying high-performance, highly functional advanced materials.

Expands Business

In February, JX Advanced Metals has established CVD･ALD Material Business Promotion Office. Accordingly, the new office aims to achieve forward-looking business development in a new business area.

The market for materials used in the semiconductor devices manufacturing process will see continued growth. Moreover, the company’s sputtering targets for semiconductors, which represent one of its core products, have secured the world’s largest share of the market. Thanks to high appraisals across the industry for their effectiveness in the PVD of thin films deposition on semiconductor chips.

Because further miniaturization and multi-layering in cutting-edge semiconductors have progressed in the coming years, there has been demand for thin film deposition. CVD･ALD Material Business Promotion Office will handle the entire scope of CVD and ALD materials for next-generation semiconductors. Thus, covering everything from efforts to identify development themes to mass-production in an integrated fashion, and work to accelerate the commercialization process.