To increase the production capacity of its Lithomax^TM photosensitive polymers for photoresists, Mitsubishi Chemical Group (MCG) has decided to build a new facility at its Kyushu-Fukuoka Plant in Kitakyushu City, Fukuoka Prefecture, Japan. Mainly, the new facility will produce Lithomax^TM for argon fluoride (ArF) photoresists and for extreme ultra-violet (EUV) photoresists.

Mainly, photosensitive polymers are resins that form the main component of photoresists. In turn, photoresists are used in the photolithography process to copy a semiconductor’s circuit pattern onto a wafer.

MCG’s Lithomax^TM products feature low metal and impurity contents. Thus, they meet the high quality required for the miniaturization of semiconductor circuits. Also, many photoresist manufacturers employ these products.

Meanwhile, ArF and EUV photoresists — a still growing market dominated by Japanese manufacturers — hold the key to further miniaturization. Therefore, the demand for Lithomax^TM as raw materials could steadily grow in the future.

Builds New Production Facility

In response to this anticipated increase in demand and to strengthen the supply chain, MCG has decided to establish a new production facility for Lithomax^TM. Specifically, the company will set up the facility at its Kyushu-Fukuoka Plant to supplement the current production at the Kanto-Tsurumi Plant in Yokohama, Kanagawa. Accordingly, this will more than double the production capacity of Lithomax^TM for ArF photoresists. Also, it signals the start of mass production of Lithomax^TM for EUV photoresists.

With a wide range of materials and services to support semiconductor manufacturing, MCG will continue to contribute to the industry with a stable, high-quality supply.

Particularly, the company plans to start production of Lithomax^TM for ArF photoresists in Oct. 2025 and Lithomax^TM for EUV photoresists in Sept. 2025.

-14 June 2024-