Lasertec Corporation has announced the release of the ACTIS A200HiT series. The new system delivers a significant enhancement in productivity for EUV mask quality assurance at wafer fabs.

In 2019, Lasertec launched the world’s first actinic1 EUV patterned mask inspection system, the ACTIS A150. Specifically, it played a vital role in enabling the quality assurance of EUV masks and has earned a strong reputation for its inspection performance across the semiconductor industry.

The new A200HiT series offers a substantial improvement in throughput compared to the previous model. Thanks to optimized optics and a redesigned inspection system while achieving sufficient sensitivity to detect all printable defects that may occur in the wafer fabs. This contributes to yield improvement in the wafer fabs by reducing mask inspection costs and increasing productivity.

Lasertec remains committed to the advancement of leading-edge semiconductor manufacturing by delivering innovative solutions that improve quality and productivity. Therefore, contributing to the continued evolution of the industry.

Features

• Triple inspection speed of ACTIS A150

• Detection of printable defects during EUV mask operations at wafer fabs

Applications

• Incoming EUV mask inspection at wafer fabs

• Periodic quality assurance inspection of EUV mask at wafer fabs

05 November 2025